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Proceedings of the Annual Conference of the Institute of Image Electronics Engineers of Japan | Vol., Issue. | | Pages 7-3

Detection of edge widths and roughness in LSI fine patterns

Tomomichi KUSAJIMA Takamune SATO Akio SUGANO Izumi SANTO Minoru Ito

Abstract

This paper describes a new approach for detecting edge roughness and edge width properties of LSI fine patterns. Detection of edge properties of LSI circuit patterns is indispensable in LSI production fields. In our previously proposed ERA method to detect edge positions, the available edge threshold level was just half of the edge amplitude. In this paper, optimization of function-fitting to edge cross-section distributions is presented. It enables us to accurately and reliably detect edge roughness for various edge levels and edge width distributions along edge lines.

Original Text (This is the original text for your reference.)

Detection of edge widths and roughness in LSI fine patterns

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Keywords

detection of edge properties of lsi circuit patterns era method edge threshold level detecting edge roughness lsi production functionfitting to edge crosssection distributions approach

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Tomomichi KUSAJIMA Takamune SATO Akio SUGANO Izumi SANTO Minoru Ito,.Detection of edge widths and roughness in LSI fine patterns. (),7-3.

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