Electrochemical sensors have been used either as a whole or as an integral part of a chemical and biological sensing device. Microfabrication technology has been used in the development of electrochemical sensors. The recent advancement of micromachining techniques adds new impetus to electrochemical sensor development. Most noticeable is the application of anisotropic chemical etching, plasma etching, sacrificial layer methods, and high aspect ratio X-ray lithography to enhance the opportunity to produce scientifically and commercially viable electrochemical sensors. Examples will be used to illustrate the potential of microfabrication and micromachining techniques in electrochemical sensor development.

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chemical and biological sensing device microfabrication technology aspect ratio xray electrochemical sensor development microfabrication and micromachining techniques anisotropic chemical etching plasma etching sacrificial layer methods

C C, Liu,.Applications of microfabrication techniques in electrochemical sensor development.. 41 (1-2),99-107.

C C, Liu,"Applications of microfabrication techniques in electrochemical sensor development." 41

C C, Liu,"Applications of microfabrication techniques in electrochemical sensor development."